Toward high-throughput deposition of III-V materials and devices using halide vapor phase epitaxy

Published in Physics, Simulation, and Photonic Engineering of Photovoltaic Devices XIII, 2024

Recommended citation: Ptak, Aaron J. and Hassanaly, Malik and Udwary, Kevin and Leach, Jacob H. and Dodson, Gregg and Splawn, Heather and Schulte, Kevin L. and Simon, John (2024). "Toward high-throughput deposition of III-V materials and devices using halide vapor phase epitaxy." Physics, Simulation, and Photonic Engineering of Photovoltaic Devices XIII. https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12881/1288102/Toward-high-throughput-deposition-of-III-V-materials-and-devices/10.1117/12.3003229.pdf